Dr. Jiang Hu
at Texas A&M Univ
SPIE Involvement:
Author
Publications (2)

PROCEEDINGS ARTICLE | March 21, 2007
Proc. SPIE. 6521, Design for Manufacturability through Design-Process Integration
KEYWORDS: Lithography, Diffraction, Image segmentation, Silicon, Very large scale integration, Photomasks, Optical proximity correction, Optimization (mathematics), Semiconducting wafers, Resolution enhancement technologies

PROCEEDINGS ARTICLE | May 3, 2004
Proc. SPIE. 5379, Design and Process Integration for Microelectronic Manufacturing II
KEYWORDS: Lithography, Phase shifting, Optical lithography, Silicon, Solids, Photomasks, Optical proximity correction, Computer aided design, Resolution enhancement technologies, Phase shifts

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