Dr. Jianliang Li
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Publications (13)

PROCEEDINGS ARTICLE | March 28, 2016
Proc. SPIE. 9780, Optical Microlithography XXIX
KEYWORDS: Cadmium, Data modeling, Etching, Metals, Image processing, 3D modeling, Optical proximity correction, Reactive ion etching, Semiconducting wafers, Back end of line

PROCEEDINGS ARTICLE | March 13, 2012
Proc. SPIE. 8326, Optical Microlithography XXV
KEYWORDS: Optical lithography, Cadmium, Calibration, Scanning electron microscopy, Printing, Photomasks, Optical proximity correction, SRAF, Semiconducting wafers, Binary data

PROCEEDINGS ARTICLE | September 25, 2010
Proc. SPIE. 7823, Photomask Technology 2010
KEYWORDS: Optical lithography, Data modeling, Calibration, Etching, Signal processing, Photomasks, Optical proximity correction, Photoresist processing, Semiconducting wafers, Process modeling

PROCEEDINGS ARTICLE | March 22, 2010
Proc. SPIE. 7640, Optical Microlithography XXIII
KEYWORDS: Mathematical modeling, Lithography, Data modeling, Photomasks, Optical proximity correction, Optimization (mathematics), Photoresist processing, Statistical modeling, Performance modeling, Process modeling

PROCEEDINGS ARTICLE | March 16, 2009
Proc. SPIE. 7274, Optical Microlithography XXII
KEYWORDS: Lithography, Data modeling, Calibration, 3D modeling, Photomasks, Optical proximity correction, Photoresist processing, Semiconducting wafers, Photoresist developing, Process modeling

PROCEEDINGS ARTICLE | March 13, 2009
Proc. SPIE. 7275, Design for Manufacturability through Design-Process Integration III
KEYWORDS: Lithography, Optical lithography, Data modeling, Calibration, Metals, Finite element methods, Optical proximity correction, Semiconducting wafers, Performance modeling, Process modeling

Showing 5 of 13 publications
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