Dr. Jianliang Li
SPIE Involvement:
Author
Publications (14)

Proceedings Article | 16 October 2019
Proc. SPIE. 11148, Photomask Technology 2019
KEYWORDS: Lithography, Data modeling, Opacity, Calibration, Etching, Manufacturing, Photomasks, Optical proximity correction, Critical dimension metrology, Semiconducting wafers

Proceedings Article | 28 March 2016
Proc. SPIE. 9780, Optical Microlithography XXIX
KEYWORDS: Cadmium, Data modeling, Etching, Metals, Image processing, 3D modeling, Optical proximity correction, Reactive ion etching, Semiconducting wafers, Back end of line

Proceedings Article | 13 March 2012
Proc. SPIE. 8326, Optical Microlithography XXV
KEYWORDS: Optical lithography, Cadmium, Calibration, Scanning electron microscopy, Printing, Photomasks, Optical proximity correction, SRAF, Semiconducting wafers, Binary data

Proceedings Article | 25 September 2010
Proc. SPIE. 7823, Photomask Technology 2010
KEYWORDS: Optical lithography, Data modeling, Calibration, Etching, Signal processing, Photomasks, Optical proximity correction, Photoresist processing, Semiconducting wafers, Process modeling

Proceedings Article | 22 March 2010
Proc. SPIE. 7640, Optical Microlithography XXIII
KEYWORDS: Mathematical modeling, Lithography, Data modeling, Photomasks, Optical proximity correction, Optimization (mathematics), Photoresist processing, Statistical modeling, Performance modeling, Process modeling

Showing 5 of 14 publications
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