Dr. Jianming Zhou
at
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Publications (17)

PROCEEDINGS ARTICLE | October 20, 2016
Proc. SPIE. 9778, Metrology, Inspection, and Process Control for Microlithography XXX

PROCEEDINGS ARTICLE | March 24, 2016
Proc. SPIE. 9778, Metrology, Inspection, and Process Control for Microlithography XXX
KEYWORDS: Diffraction, Optical design, Light sources, Metrology, Polarization, Inspection, Reflectivity, Interference (communication), Scatterometry, Semiconducting wafers, Electromagnetic simulation, Overlay metrology, Device simulation

PROCEEDINGS ARTICLE | April 20, 2011
Proc. SPIE. 7971, Metrology, Inspection, and Process Control for Microlithography XXV
KEYWORDS: Thin films, Diffraction, Reflection, Sensors, Scanners, Manufacturing, Spatial light modulators, Optical alignment, Semiconducting wafers, Signal detection

PROCEEDINGS ARTICLE | March 4, 2010
Proc. SPIE. 7640, Optical Microlithography XXIII
KEYWORDS: Data modeling, Calibration, Scanners, Computer simulations, Finite element methods, Computational lithography, Critical dimension metrology, Optimization (mathematics), Semiconducting wafers, Thermal modeling

PROCEEDINGS ARTICLE | March 4, 2010
Proc. SPIE. 7640, Optical Microlithography XXIII
KEYWORDS: Wafer-level optics, Metrology, Data modeling, Calibration, Scanners, Optical simulations, Critical dimension metrology, Semiconducting wafers, Optics manufacturing, Performance modeling

PROCEEDINGS ARTICLE | March 16, 2009
Proc. SPIE. 7274, Optical Microlithography XXII
KEYWORDS: Reticles, Metrology, Cadmium, Data modeling, Calibration, Scanners, Scanning electron microscopy, Printing, Scatterometry, Semiconducting wafers

Showing 5 of 17 publications
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