Jie Wei Sun
Senior Engineer at United Microelectronics Corp
SPIE Involvement:
Author
Publications (4)

Proceedings Article | 24 March 2006
Proc. SPIE. 6152, Metrology, Inspection, and Process Control for Microlithography XX
KEYWORDS: Lithography, Metrology, Data modeling, Scatterometry, Process control, Finite element methods, Photoresist processing, Semiconducting wafers, Scatter measurement, Single crystal X-ray diffraction

Proceedings Article | 21 March 2006
Proc. SPIE. 6154, Optical Microlithography XIX
KEYWORDS: Semiconductors, Lithography, Calibration, Image processing, Manufacturing, Scanning electron microscopy, Image quality, Photomasks, Optical proximity correction, Semiconducting wafers

Proceedings Article | 5 November 2005
Proc. SPIE. 5992, 25th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Semiconductors, Lithography, Calibration, Image segmentation, Manufacturing, Scanning electron microscopy, Image quality, Photomasks, Optical proximity correction, Semiconducting wafers

Proceedings Article | 10 May 2005
Proc. SPIE. 5752, Metrology, Inspection, and Process Control for Microlithography XIX
KEYWORDS: Lithography, Metrology, Etching, Inspection, Scatterometry, Spectroscopic ellipsometry, Critical dimension metrology, Semiconducting wafers, Temperature metrology, Single crystal X-ray diffraction

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