Dr. Jie Li Profile

Dr. Jie Li

at China Academy of Engineering Physics

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Publications (6)

PROCEEDINGS ARTICLE | March 5, 2018

Research on precision grinding technology of large scale and ultra thin optics

Proc. SPIE. 10710, Young Scientists Forum 2017

KEYWORDS: Optical components, Sensors, Adaptive optics, Optical testing, Optics manufacturing

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PROCEEDINGS ARTICLE | January 10, 2018

A method for improving the measurement accuracy of lateral shearing interferometry

Proc. SPIE. 10618, 2017 International Conference on Optical Instruments and Technology: Advanced Optical Sensors and Applications

KEYWORDS: Monochromatic aberrations, Sensors, Calibration, Error analysis, Interferometry, Wavefronts, Zernike polynomials, Extreme ultraviolet, Geometrical optics, Shearing interferometers

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PROCEEDINGS ARTICLE | October 24, 2017

An accurate method for investigation of laser-induced damage of optical component at 351nm

Proc. SPIE. 10457, AOPC 2017: Laser Components, Systems, and Applications

KEYWORDS: Optical components, Silica, Laser induced damage, Laser damage threshold

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PROCEEDINGS ARTICLE | October 24, 2017

Preliminary study of the influence of polarization orientation on bulk damage resistances of doubler KDP crystals

Proc. SPIE. 10457, AOPC 2017: Laser Components, Systems, and Applications

KEYWORDS: Polarization, Crystals, Crystallography

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SPIE Journal Paper | February 22, 2017

Method for improving measurement efficiency of lateral shearing interferometry

Li, Jie , Tang, Feng , Wang, Xiangzhao , Dai, Fengzhao , Ding, Lei , Chen, Bo , Yang, Xiaoyu , Chai, Liqun

OE Vol. 56 Issue 02

KEYWORDS: Wavefronts, Error analysis, Zernike polynomials, Interferometry, Wavefront reconstruction, Optical engineering, Computer simulations, Statistical analysis, Optical testing, Sensors

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PROCEEDINGS ARTICLE | March 13, 2015

Calibration of system errors in lateral shearing interferometer for EUV-wavefront metrology

Proc. SPIE. 9422, Extreme Ultraviolet (EUV) Lithography VI

KEYWORDS: Monochromatic aberrations, Sensors, Calibration, Error analysis, Interferometry, Wavefronts, Zernike polynomials, Extreme ultraviolet, Extreme ultraviolet lithography, EUV optics

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Showing 5 of 6 publications

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