Dr. Jie Li
at Onto Innovation Inc
SPIE Involvement:
Author
Publications (22)

Proceedings Article | 27 April 2023 Presentation + Paper
Proceedings Volume 12496, 124960F (2023) https://doi.org/10.1117/12.2658148
KEYWORDS: Education and training, Semiconducting wafers, Overlay metrology, Critical dimension metrology, Mueller matrices, 3D metrology, Data modeling, 3D modeling, Machine learning, Spectral response

Proceedings Article | 22 February 2021 Presentation + Paper
Proceedings Volume 11611, 116111P (2021) https://doi.org/10.1117/12.2583774
KEYWORDS: Metrology, Machine learning, Signal processing, Semiconductors, Data modeling, Time metrology, Data processing

Proceedings Article | 22 February 2021 Presentation + Paper
Adam Ginsburg, Israel Reichental, Alex Dikopoltsev, Alex Krokhmal, Yuri Vinshtein, Paul Ryan, Rahul Korlahalli, Franklin Wong, Silvio Rabello, Yang Song, Jie Li, Matthew Wormington
Proceedings Volume 11611, 116110W (2021) https://doi.org/10.1117/12.2583966
KEYWORDS: X-rays, Semiconductors, Critical dimension metrology, Semiconducting wafers, Metrology, X-ray characterization, Scattering, Etching, Capacitors, 3D metrology

SPIE Journal Paper | 16 October 2014
Jie Li, Shahin Zangooie, Karthik Boinapally, Xi Zou, Jiangtao Hu, Zhuan Liu, Sanjay Yedur, Peter Wilkens, Avraham Ver, Robert Cohen, Babak Khamsehpour, Holger Schroder, John Piggot
JM3, Vol. 13, Issue 04, 041406, (October 2014) https://doi.org/10.1117/12.10.1117/1.JMM.13.4.041406
KEYWORDS: Critical dimension metrology, Scatterometry, Line edge roughness, Reactive ion etching, Metrology, Scatter measurement, Semiconducting wafers, Optics manufacturing, Magnetism, Etching

Proceedings Article | 2 April 2014 Paper
Jie Li, Shahin Zangooie, Karthik Boinapally, Jiangtao Hu, Zhuan Liu, Sanjay Yedur, Peter Wilkens, Avraham Ver, Robert Cohen, Babak Khamsepour, Xi Zou
Proceedings Volume 9050, 90502T (2014) https://doi.org/10.1117/12.2046639
KEYWORDS: Reactive ion etching, Scatterometry, Critical dimension metrology, Metrology, Magnetism, Manufacturing, Photomasks, Etching, Measurement devices, Semiconducting wafers

Showing 5 of 22 publications
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