Dr. Jie Li
at Onto Innovation Inc
SPIE Involvement:
Author
Publications (21)

Proceedings Article | 22 February 2021 Presentation + Paper
Proc. SPIE. 11611, Metrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV
KEYWORDS: Semiconductors, Metrology, Data modeling, Time metrology, Data processing, Signal processing, Machine learning

Proceedings Article | 22 February 2021 Presentation + Paper
Proc. SPIE. 11611, Metrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV
KEYWORDS: Semiconductors, Metrology, Capacitors, Scattering, Etching, X-rays, 3D metrology, Critical dimension metrology, Semiconducting wafers, X-ray characterization

SPIE Journal Paper | 16 October 2014
JM3 Vol. 13 Issue 04
KEYWORDS: Critical dimension metrology, Scatterometry, Line edge roughness, Reactive ion etching, Metrology, Scatter measurement, Semiconducting wafers, Optics manufacturing, Magnetism, Etching

Proceedings Article | 2 April 2014 Paper
Proc. SPIE. 9050, Metrology, Inspection, and Process Control for Microlithography XXVIII
KEYWORDS: Ellipsometry, Metrology, Data modeling, Manufacturing, Scatterometry, Critical dimension metrology, Line edge roughness, Reactive ion etching, Semiconducting wafers, Scatter measurement

Proceedings Article | 2 April 2014 Paper
Proc. SPIE. 9050, Metrology, Inspection, and Process Control for Microlithography XXVIII
KEYWORDS: Metrology, Etching, Manufacturing, Magnetism, Scatterometry, Measurement devices, Photomasks, Critical dimension metrology, Reactive ion etching, Semiconducting wafers

Showing 5 of 21 publications
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