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Jihoon Woo
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Publications (2)
Proceedings Article | 9 April 2024 Presentation + Paper
Understanding the stability of advanced inorganic-organic hybrid thin films for advanced resist applications
Dan Le, Thi Thu Huong Chu, Jin-Hyun Kim, Jean-Francois Veyan, Won-Il Lee, Nikhil Tiwale, Minjong Lee, Seungsoo Choi, Jihoon Woo, Chang-Yong Nam, Rino Choi, Jiyoung Kim
Proceedings Volume 12957, 129570B (2024) https://doi.org/10.1117/12.3010970
KEYWORDS: Thin films, Film thickness, X-ray photoelectron spectroscopy, Atomic layer deposition, Chemical analysis, Aluminum, Carbon monoxide, Materials science, Extreme ultraviolet lithography, Engineering
Proceedings Article | 1 December 2022 Presentation + Paper
Chemical reactions induced by low-energy electron exposure on a novel inorganic-organic hybrid dry EUV photoresist deposited by molecular atomic layer deposition (MALD)
Proceedings Volume 12292, 1229205 (2022) https://doi.org/10.1117/12.2641647
KEYWORDS: Thin films, Extreme ultraviolet lithography, Electron beam lithography, FT-IR spectroscopy, Photoresist materials, Chemical reactions, Floods, Atomic layer deposition, Chemical analysis, Thin film deposition
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