Jim N. Wiley
Photomask Infrastructure Strategist at Wiley Strategic Solutions
SPIE Involvement:
Conference Program Committee | Conference Chair | Symposium Chair | Author
Profile Summary

EUV lithography infrastructure development strategy focusing on EUV mask technology and EUV mask economics
Publications (36)

Proceedings Article | 18 October 2018
Proc. SPIE. 10810, Photomask Technology 2018
KEYWORDS: Metrology, Liquid phase epitaxy, Error analysis, Inspection, Photomasks, Extreme ultraviolet, Cadmium sulfide, Nanoimprint lithography, Critical dimension metrology, Semiconducting wafers

Proceedings Article | 26 September 2016
Proc. SPIE. 9985, Photomask Technology 2016
KEYWORDS: Reticles, Scanners, Particles, Inspection, Pellicles, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, High volume manufacturing, Semiconducting wafers

Proceedings Article | 18 March 2016
Proc. SPIE. 9776, Extreme Ultraviolet (EUV) Lithography VII
KEYWORDS: Reticles, Optical lithography, Imaging systems, Scanners, Particles, Inspection, Pellicles, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, High volume manufacturing, Semiconducting wafers

Proceedings Article | 29 September 2010
Proc. SPIE. 7823, Photomask Technology 2010
KEYWORDS: Point spread functions, Electron beams, Data modeling, Scattering, Chromium, Monte Carlo methods, Photomasks, Extreme ultraviolet, Tantalum, Process modeling

Proceedings Article | 27 May 2010
Proc. SPIE. 7748, Photomask and Next-Generation Lithography Mask Technology XVII
KEYWORDS: Metrology, Optical lithography, Scattering, Manufacturing, Time metrology, Photomasks, Extreme ultraviolet, Computational lithography, Critical dimension metrology, EUV optics

Showing 5 of 36 publications
Conference Committee Involvement (4)
Photomask Technology
1 October 2002 | Monterey, CA, United States
15th Annual BACUS Symposium on Photomask Technology and Management
20 September 1995 | Santa Clara, CA, United States
15th Annual BACUS Symposium on Photomask Technology and Management '95
20 September 1995 | Santa Clara, United States
Tenth Annual Symposium on Microlithography
26 September 1990 | Sunnyvale, CA, United States
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