Jimmy Hu
at Taiwan Semiconductor Manufacturing Co Ltd
SPIE Involvement:
Author
Publications (8)

PROCEEDINGS ARTICLE | March 23, 2012
Proc. SPIE. 8322, Extreme Ultraviolet (EUV) Lithography III
KEYWORDS: Lithography, Diffusion, Image resolution, Electroluminescence, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Nanoimprint lithography, Modulation transfer functions, Performance modeling

PROCEEDINGS ARTICLE | April 8, 2011
Proc. SPIE. 7969, Extreme Ultraviolet (EUV) Lithography II
KEYWORDS: Lithography, Optical lithography, Imaging systems, Scanners, Electroluminescence, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers, Phase shifts

PROCEEDINGS ARTICLE | April 7, 2011
Proc. SPIE. 7969, Extreme Ultraviolet (EUV) Lithography II
KEYWORDS: Lithography, Etching, Manufacturing, Inspection, Chromium, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Deposition processes, Defect inspection

PROCEEDINGS ARTICLE | March 24, 2009
Proc. SPIE. 7272, Metrology, Inspection, and Process Control for Microlithography XXIII
KEYWORDS: Carbon, Lithography, Refractive index, Birefringence, Scatterometry, Finite element methods, Critical dimension metrology, Semiconducting wafers, Absorption, Anisotropy

PROCEEDINGS ARTICLE | March 23, 2009
Proc. SPIE. 7272, Metrology, Inspection, and Process Control for Microlithography XXIII
KEYWORDS: Lithography, Metrology, Scanners, Scatterometry, Finite element methods, Photomasks, Double patterning technology, Critical dimension metrology, Semiconducting wafers, Overlay metrology

PROCEEDINGS ARTICLE | March 23, 2009
Proc. SPIE. 7272, Metrology, Inspection, and Process Control for Microlithography XXIII
KEYWORDS: Metrology, Calibration, Scanners, Scanning electron microscopy, Scatterometry, Mining, Critical dimension metrology, Semiconducting wafers, Wafer testing, Overlay metrology

Showing 5 of 8 publications
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