Jinback Park
at SAMSUNG Electronics Co Ltd
SPIE Involvement:
Publications (8)

Proceedings Article | 5 October 2016
Proc. SPIE. 9985, Photomask Technology 2016
KEYWORDS: Lithography, Reticles, Metrology, Deep ultraviolet, Calibration, Databases, Image registration, Photomasks, Extreme ultraviolet, Overlay metrology

Proceedings Article | 27 May 2010
Proc. SPIE. 7748, Photomask and Next-Generation Lithography Mask Technology XVII
KEYWORDS: Data modeling, Etching, Silicon, Atomic force microscopy, Scanning electron microscopy, Photomasks, Extreme ultraviolet, Critical dimension metrology, Ruthenium, EUV optics

Proceedings Article | 17 October 2008
Proc. SPIE. 7122, Photomask Technology 2008
KEYWORDS: Ultraviolet radiation, Chromium, Atomic force microscopy, Optical testing, Scanning electron microscopy, Scatterometry, Process control, Critical dimension metrology, Scatter measurement, Binary data

Proceedings Article | 14 May 2007
Proc. SPIE. 6607, Photomask and Next-Generation Lithography Mask Technology XIV
KEYWORDS: Semiconductors, Reticles, Air contamination, Crystals, Electroluminescence, Photomasks, Critical dimension metrology, Semiconducting wafers, Binary data, Phase shifts

Proceedings Article | 20 October 2006
Proc. SPIE. 6349, Photomask Technology 2006
KEYWORDS: Semiconductors, Ellipsometry, Lithography, Air contamination, Electroluminescence, Pellicles, Spectroscopic ellipsometry, Transmittance, Photomasks, Critical dimension metrology

Showing 5 of 8 publications
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