Dr. Jinphil Choi
Principal Engineer at SAMSUNG Electronics Co Ltd
SPIE Involvement:
Author
Publications (9)

PROCEEDINGS ARTICLE | April 11, 2017
Proc. SPIE. 10147, Optical Microlithography XXX
KEYWORDS: Manufacturing

PROCEEDINGS ARTICLE | March 24, 2017
Proc. SPIE. 10147, Optical Microlithography XXX
KEYWORDS: Metrology, Lithographic illumination, Data modeling, Calibration, Image processing, Scanners, Laser scanners, Process control, Finite element methods, Photomasks, Computational lithography, 3D scanning, Critical dimension metrology, Semiconducting wafers

PROCEEDINGS ARTICLE | April 2, 2014
Proc. SPIE. 9050, Metrology, Inspection, and Process Control for Microlithography XXVIII
KEYWORDS: Lithography, Reticles, Metrology, Scanners, Control systems, Computer simulations, Scanning electron microscopy, Signal processing, Process control, Semiconducting wafers

PROCEEDINGS ARTICLE | April 2, 2014
Proc. SPIE. 9050, Metrology, Inspection, and Process Control for Microlithography XXVIII
KEYWORDS: Code division multiplexing, Monochromatic aberrations, Sensors, Scanners, Error analysis, Control systems, Process control, Finite element methods, Critical dimension metrology, Semiconducting wafers

PROCEEDINGS ARTICLE | March 31, 2014
Proc. SPIE. 9052, Optical Microlithography XXVII
KEYWORDS: Lithography, Optical lithography, Image processing, Error analysis, Photomasks, Double patterning technology, Image contrast enhancement, Photoresist processing, Semiconducting wafers, Overlay metrology

PROCEEDINGS ARTICLE | April 12, 2013
Proc. SPIE. 8683, Optical Microlithography XXVI
KEYWORDS: Diffraction, Reticles, Data modeling, Calibration, Scanners, Wavefronts, Control systems, 3D modeling, Photomasks, Semiconducting wafers

Showing 5 of 9 publications
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