Jin-Sik Jung
at SAMSUNG Electronics Co Ltd
SPIE Involvement:
Publications (5)

Proceedings Article | 20 October 2008 Paper
Han-Shin Lee, Jaehyuck Choi, Jin-Sik Jung, Jong-Keun Oh, Soo-Jung Kang, Hae-Young Jeong, Sang-Gyun Woo, HanKu Cho
Proceedings Volume 7122, 712217 (2008) https://doi.org/10.1117/12.801422
KEYWORDS: Air contamination, Ions, Resistance, Sulfur, Photomasks, Contamination, Transmittance, Surface roughness, Chemical analysis, Molecules

Proceedings Article | 19 May 2008 Paper
Jaehyuck Choi, Jin-sik Jung, Han-shin Lee, Jongkeun Oh, Soojung Kang, Haeyong Jeong, Yonghoon Kim, HanKu Cho
Proceedings Volume 7028, 702818 (2008) https://doi.org/10.1117/12.793049
KEYWORDS: Air contamination, Ions, Oxides, Photomasks, Industrial chemicals, Profiling, Sulfur, Scanning probe microscopy, Information operations, Silica

Proceedings Article | 29 May 2007 Paper
Jaehyuck Choi, Han-shin Lee, Jin-sik Jung, Byung Cheol Cha, Sang-Gyun Woo, HanKu Cho
Proceedings Volume 6607, 660709 (2007) https://doi.org/10.1117/12.728922
KEYWORDS: Ions, Air contamination, Chromium, Sulfur, Profiling, Photomasks, Molybdenum, Surface roughness, Chemical analysis, Industrial chemicals

Proceedings Article | 14 May 2007 Paper
Jin-Sik Jung, Hee-Bom Kim, Jeung-Woo Lee, Sang-Gyun Woo, Han-Ku Cho
Proceedings Volume 6607, 66071I (2007) https://doi.org/10.1117/12.728965
KEYWORDS: Oxides, Photomasks, Nanoimprint lithography, Binary data, Resolution enhancement technologies, Etching, Manufacturing, Chromium, Diffraction, Phase shifts

Proceedings Article | 27 March 2007 Paper
Proceedings Volume 6520, 652026 (2007) https://doi.org/10.1117/12.711328
KEYWORDS: Oxides, Nanoimprint lithography, Binary data, Manufacturing, Etching, Optics manufacturing, Chromium, Diffraction, Phase shifts, Near field

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