Jin-Sik Jung
at SAMSUNG Electronics Co Ltd
SPIE Involvement:
Author
Publications (5)

Proceedings Article | 20 October 2008 Paper
Proc. SPIE. 7122, Photomask Technology 2008
KEYWORDS: Contamination, Air contamination, Molecules, Ions, Sulfur, Resistance, Surface roughness, Transmittance, Photomasks, Chemical analysis

Proceedings Article | 19 May 2008 Paper
Proc. SPIE. 7028, Photomask and Next-Generation Lithography Mask Technology XV
KEYWORDS: Oxides, Silica, Air contamination, Ions, Sulfur, Profiling, Photomasks, Scanning probe microscopy, Information operations, Industrial chemicals

Proceedings Article | 29 May 2007 Paper
Proc. SPIE. 6607, Photomask and Next-Generation Lithography Mask Technology XIV
KEYWORDS: Air contamination, Ions, Sulfur, Surface roughness, Chromium, Profiling, Photomasks, Chemical analysis, Molybdenum, Industrial chemicals

Proceedings Article | 14 May 2007 Paper
Proc. SPIE. 6607, Photomask and Next-Generation Lithography Mask Technology XIV
KEYWORDS: Oxides, Diffraction, Etching, Manufacturing, Chromium, Photomasks, Nanoimprint lithography, Binary data, Resolution enhancement technologies, Phase shifts

Proceedings Article | 27 March 2007 Paper
Proc. SPIE. 6520, Optical Microlithography XX
KEYWORDS: Oxides, Diffraction, Etching, Manufacturing, Chromium, Near field, Nanoimprint lithography, Optics manufacturing, Binary data, Phase shifts

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