Jin-Soo Kim
at Hynix Semiconductor Inc
SPIE Involvement:
Publications (22)

Proceedings Article | 2 April 2014 Paper
Jin-Soo Kim, Won-Kwang Ma, Young-Sik Kim, Myoung-Soo Kim, Won-Taik Kwon, Sung-Ki Park, Peter Nikolsky, Marian Otter, Maryana Escalante Marun, Roy Anunciado, Kyu-Tae Sun, Greet Storms, Ewould van West
Proceedings Volume 9050, 905037 (2014) https://doi.org/10.1117/12.2057390
KEYWORDS: Semiconducting wafers, Critical dimension metrology, Yield improvement, Semiconductors, Etching, Photoresist processing, Optical lithography, Process control, Overlay metrology, Manufacturing

Proceedings Article | 4 December 2008 Paper
Proceedings Volume 7140, 71401K (2008) https://doi.org/10.1117/12.804651
KEYWORDS: Photomasks, Optical lithography, Reflectivity, Immersion lithography, Lithography, Image processing, Image enhancement, Polarization, Semiconducting wafers, Transmittance

Proceedings Article | 7 March 2008 Paper
Proceedings Volume 6924, 69244V (2008) https://doi.org/10.1117/12.772446
KEYWORDS: Transistors, Optical lithography, Photomasks, Lithography, Printing, 3D image processing, Binary data, Critical dimension metrology, Etching, Photoresist processing

Proceedings Article | 7 March 2008 Paper
Tae-Seung Eom, Jun-Taek Park, Jung-Hyun Kang, Sarohan Park, Sunyoung Koo, Jin-Soo Kim, Byoung-Hoon Lee, Chang-Moon Lim, HyeongSoo Kim, Seung-Chan Moon
Proceedings Volume 6924, 69240H (2008) https://doi.org/10.1117/12.772246
KEYWORDS: Photomasks, Chromium, Binary data, Polarization, Pellicles, Diffraction, Scanners, Phase shifts, Lithography, Immersion lithography

Proceedings Article | 26 March 2007 Paper
Proceedings Volume 6520, 65200B (2007) https://doi.org/10.1117/12.712442
KEYWORDS: Polarization, Optical lithography, Photomasks, Birefringence, Transmittance, Scanners, Lithography, Lithographic illumination, Immersion lithography, Critical dimension metrology

Showing 5 of 22 publications
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