Jin-Soo Kim
at Hynix Semiconductor Inc
SPIE Involvement:
Author
Publications (22)

Proceedings Article | 2 April 2014
Proc. SPIE. 9050, Metrology, Inspection, and Process Control for Microlithography XXVIII
KEYWORDS: Semiconductors, Optical lithography, Etching, Manufacturing, Process control, Critical dimension metrology, Photoresist processing, Semiconducting wafers, Yield improvement, Overlay metrology

Proceedings Article | 4 December 2008
Proc. SPIE. 7140, Lithography Asia 2008
KEYWORDS: Lithography, Optical lithography, Polarization, Image processing, Reflectivity, Transmittance, Photomasks, Image enhancement, Immersion lithography, Semiconducting wafers

Proceedings Article | 7 March 2008
Proc. SPIE. 6924, Optical Microlithography XXI
KEYWORDS: Lithography, Diffraction, Polarization, Scanners, Chromium, Pellicles, Photomasks, Immersion lithography, Binary data, Phase shifts

Proceedings Article | 7 March 2008
Proc. SPIE. 6924, Optical Microlithography XXI
KEYWORDS: Lithography, Optical lithography, Etching, Printing, Photomasks, Transistors, Critical dimension metrology, Photoresist processing, Binary data, 3D image processing

Proceedings Article | 26 March 2007
Proc. SPIE. 6520, Optical Microlithography XX
KEYWORDS: Lithography, Optical lithography, Lithographic illumination, Polarization, Birefringence, Scanners, Transmittance, Photomasks, Immersion lithography, Critical dimension metrology

Proceedings Article | 26 June 2003
Proc. SPIE. 5040, Optical Microlithography XVI
KEYWORDS: Lithography, Lithographic illumination, Etching, Printing, Photomasks, Optical proximity correction, Critical dimension metrology, Forward error correction, Photoresist processing, Semiconducting wafers

Showing 5 of 22 publications
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