Jin-Young Choi
at SK Hynix Inc
SPIE Involvement:
Author
Publications (6)

Proceedings Article | 20 March 2012
Proc. SPIE. 8325, Advances in Resist Materials and Processing Technology XXIX
KEYWORDS: Lithography, Reticles, Lithographic illumination, Image processing, Scanning electron microscopy, Optical proximity correction, Photoresist processing, Semiconducting wafers, Standards development, Resolution enhancement technologies

Proceedings Article | 4 March 2010
Proc. SPIE. 7640, Optical Microlithography XXIII
KEYWORDS: Lithography, Scanners, Control systems, Process control, Shape analysis, Optical proximity correction, Critical dimension metrology, Semiconducting wafers, Instrument modeling, Fiber optic illuminators

Proceedings Article | 16 March 2009
Proc. SPIE. 7274, Optical Microlithography XXII
KEYWORDS: Semiconductors, Metrology, Data modeling, Printing, Photomasks, Optical proximity correction, Critical dimension metrology, Systems modeling, Overlay metrology

Proceedings Article | 4 December 2008
Proc. SPIE. 7140, Lithography Asia 2008
KEYWORDS: Lithography, Optical lithography, Diffractive optical elements, Printing, Source mask optimization, SRAF, Photoresist processing, Semiconducting wafers, Resolution enhancement technologies, Fiber optic illuminators

Proceedings Article | 4 December 2008
Proc. SPIE. 7140, Lithography Asia 2008
KEYWORDS: Metrology, Data modeling, Databases, Etching, Error analysis, Thermal effects, Transistors, Optical proximity correction, Critical dimension metrology, Semiconducting wafers

Proceedings Article | 7 March 2008
Proc. SPIE. 6924, Optical Microlithography XXI
KEYWORDS: Lithography, Optical lithography, Etching, Printing, Photomasks, Transistors, Critical dimension metrology, Photoresist processing, Binary data, 3D image processing

Showing 5 of 6 publications
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