Dr. Jin-Goo Park
at Hanyang Univ
SPIE Involvement:
Author
Publications (9)

SPIE Journal Paper | October 12, 2017
JM3 Vol. 16 Issue 04
KEYWORDS: Pellicles, Particles, Extreme ultraviolet, Critical dimension metrology, Extreme ultraviolet lithography, Photomasks, Distortion, Chromium, Scanners, High volume manufacturing

PROCEEDINGS ARTICLE | March 24, 2017
Proc. SPIE. 10143, Extreme Ultraviolet (EUV) Lithography VIII
KEYWORDS: Silicon, Pellicles, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Silicon carbide

PROCEEDINGS ARTICLE | September 26, 2016
Proc. SPIE. 9985, Photomask Technology 2016
KEYWORDS: Lithography, Optical lithography, Contamination, Pellicles, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Critical dimension metrology, Neodymium, Lead

SPIE Journal Paper | October 7, 2015
JM3 Vol. 14 Issue 04
KEYWORDS: Extreme ultraviolet, Pellicles, Reflectivity, Extreme ultraviolet lithography, Semiconducting wafers, Radiation effects, Deep ultraviolet, Photomasks, Silicon carbide, Mirrors

PROCEEDINGS ARTICLE | July 9, 2015
Proc. SPIE. 9658, Photomask Japan 2015: Photomask and Next-Generation Lithography Mask Technology XXII
KEYWORDS: Optical lithography, Iron, Metals, Particles, Photomasks, Extreme ultraviolet, Aluminum, Extreme ultraviolet lithography, Critical dimension metrology, Mass attenuation coefficient

PROCEEDINGS ARTICLE | March 19, 2015
Proc. SPIE. 9422, Extreme Ultraviolet (EUV) Lithography VI
KEYWORDS: Deep ultraviolet, Silicon, Reflectivity, Pellicles, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Silicon carbide, Radiation effects, Semiconducting wafers

Showing 5 of 9 publications
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