Prof. Jinho Ahn
Professor at Hanyang Univ
SPIE Involvement:
Conference Program Committee | Author | Instructor
Publications (48)

Proceedings Article | 10 April 2024 Poster + Paper
Haneul Kim, Jungyeon Kim, Young-Woo Kang, Min-woo Kim, Tae Joong Ha, Gi Sung Lee, Hye-Keun Oh, Jinho Ahn
Proceedings Volume 12953, 129531B (2024)
KEYWORDS: Pellicles, Porosity, Transmittance, Extreme ultraviolet, Simulations, Film thickness, Lithography, Extreme ultraviolet lithography, Finite element methods, Critical dimension metrology

Proceedings Article | 10 April 2024 Presentation
Myung Mo Sung, Hyeonseok Ji, Jaehyuk Lee, Jinho Ahn, Chang Gyoun Kim, Sangsul Lee, Yasin Ekinci, Prajith Karadan, Dimitrios Kazazis
Proceedings Volume PC12953, PC129530K (2024)
KEYWORDS: Extreme ultraviolet lithography, Extreme ultraviolet, Photoresist materials, Line width roughness, Synchrotron radiation, Monolayers, Solubility, Resistance, Reproducibility, Outgassing

Proceedings Article | 10 April 2024 Presentation + Paper
Proceedings Volume 12955, 129550D (2024)
KEYWORDS: Extreme ultraviolet, Reflectometry, Scatterometry, Grazing incidence, Diffraction, Diffraction gratings, Reflectivity, Overlay metrology

Proceedings Article | 22 November 2023 Poster
Proceedings Volume PC12750, PC127500S (2023)
KEYWORDS: Phase shifts, Extreme ultraviolet, Refractive index, Interferometers, EUV optics, Ruthenium, Flat optics, Thin films, Film thickness, Optical coherence

Proceedings Article | 21 November 2023 Poster + Paper
Yunsoo Kim, Dongmin Jeong, Seungho Lee, Jinho Ahn
Proceedings Volume 12750, 127500R (2023)
KEYWORDS: Etching, Alloys, Thin films, Extreme ultraviolet, Platinum, Optical properties, Ion implantation, 3D mask effects, Ions, Tungsten

Showing 5 of 48 publications
Conference Committee Involvement (3)
International Conference on Extreme Ultraviolet Lithography 2024
29 September 2024 | Monterey, California, United States
International Conference on Extreme Ultraviolet Lithography 2023
2 October 2023 | Monterey, California, United States
International Conference on Extreme Ultraviolet Lithography 2022
26 September 2022 | Monterey, California, United States
Course Instructor
SC888: EUV Lithography
This course provides attendees with a full overview of the fundamentals, current status, and technical challenges of EUV Lithography. Topics covered include EUV Sources, EUV Source Metrology, EUV Optics, EUV systems and patterning, and EUV Mask. We will begin with an overview of the history of EUVL and cover EUV sources, EUV source metrology and EUV optics. Next is a discussion of EUVL systems and patterning. We cover the fundamental components of EUV systems and address similarities and differences to optical lithography systems. This section also covers patterning issues including flare, LER, and resist performance. We continue with an exploration of EUVL Mask technology issues such as design, materials including reflective multilayers, process and metrology. Finally we conclude with a Status Review of EUVL. Course material will be drawn from the accompanying texts EUV Sources for Lithography and EUV Lithography.
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