Prof. Jinho Ahn
Professor at Hanyang Univ
SPIE Involvement:
Author | Instructor
Publications (23)

Proceedings Article | 20 September 2020 Presentation
Proc. SPIE. 11517, Extreme Ultraviolet Lithography 2020
KEYWORDS: Reflection, Silicon, Reflectivity, Pellicles, Extreme ultraviolet, Low pressure chemical vapor deposition, Wet etching, Extreme ultraviolet lithography, Molybdenum, Semiconducting wafers

Proceedings Article | 16 October 2019 Presentation
Proc. SPIE. 11147, International Conference on Extreme Ultraviolet Lithography 2019
KEYWORDS: Lithography, Microscopes, Light sources, Defect detection, Deep ultraviolet, Inspection, Pellicles, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography

SPIE Journal Paper | 28 September 2019
JM3 Vol. 18 Issue 03
KEYWORDS: Extreme ultraviolet, Pellicles, Photomasks, Particles, Semiconducting wafers, Transmittance, Contamination, Inspection, Extreme ultraviolet lithography, Diffraction

Proceedings Article | 3 October 2018 Presentation + Paper
Proc. SPIE. 10809, International Conference on Extreme Ultraviolet Lithography 2018
KEYWORDS: Reticles, Ultraviolet radiation, Silicon, Coating, Pellicles, Transmittance, Extreme ultraviolet, Extreme ultraviolet lithography, Ruthenium, Absorption

Proceedings Article | 16 October 2017 Presentation
Proc. SPIE. 10450, International Conference on Extreme Ultraviolet Lithography 2017
KEYWORDS: Sensors, Silicon, Semiconductor lasers, Pellicles, Extreme ultraviolet, Mask cleaning

Showing 5 of 23 publications
Course Instructor
SC888: EUV Lithography
This course provides attendees with a full overview of the fundamentals, current status, and technical challenges of EUV Lithography. Topics covered include EUV Sources, EUV Source Metrology, EUV Optics, EUV systems and patterning, and EUV Mask. We will begin with an overview of the history of EUVL and cover EUV sources, EUV source metrology and EUV optics. Next is a discussion of EUVL systems and patterning. We cover the fundamental components of EUV systems and address similarities and differences to optical lithography systems. This section also covers patterning issues including flare, LER, and resist performance. We continue with an exploration of EUVL Mask technology issues such as design, materials including reflective multilayers, process and metrology. Finally we conclude with a Status Review of EUVL. Course material will be drawn from the accompanying texts EUV Sources for Lithography and EUV Lithography.
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