Dr. Byung Jin Choi
at Canon Nanotechnologies, Inc
SPIE Involvement:
Author
Publications (22)

Proceedings Article | 16 May 2019
Proc. SPIE. 10958, Novel Patterning Technologies for Semiconductors, MEMS/NEMS, and MOEMS 2019
KEYWORDS: Semiconductors, Data modeling, Capillaries, Ultraviolet radiation, Distortion, Photomasks, Nanoimprint lithography, Optical alignment, Semiconducting wafers, Overlay metrology

Proceedings Article | 3 October 2018
Proc. SPIE. 10810, Photomask Technology 2018
KEYWORDS: Polishing, Optical lithography, Particles, Control systems, Photomasks, Nanoimprint lithography, Semiconducting wafers, Surface finishing, Overlay metrology, Mask cleaning

Proceedings Article | 19 March 2018
Proc. SPIE. 10584, Novel Patterning Technologies 2018
KEYWORDS: Lithography, Optical lithography, Capillaries, Ultraviolet radiation, Particles, Photomasks, Nanoimprint lithography, Manufacturing equipment, Semiconducting wafers, Mask cleaning

Proceedings Article | 16 October 2017
Proc. SPIE. 10451, Photomask Technology 2017
KEYWORDS: Semiconductors, Lithography, Capillaries, Particles, Distortion, Photomasks, Semiconductor manufacturing, Nanoimprint lithography, Semiconducting wafers, Overlay metrology

Proceedings Article | 13 July 2017
Proc. SPIE. 10454, Photomask Japan 2017: XXIV Symposium on Photomask and Next-Generation Lithography Mask Technology
KEYWORDS: Lithography, Polishing, Curtains, Particles, Ceramics, Control systems, Photomasks, Semiconductor manufacturing, Nanoimprint lithography, Semiconducting wafers, Liquids

Showing 5 of 22 publications
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