Dr. Byung Jin Choi
at Canon Nanotechnologies, Inc
SPIE Involvement:
Author
Publications (24)

Proceedings Article | 23 March 2020 Paper
Proc. SPIE. 11324, Novel Patterning Technologies for Semiconductors, MEMS/NEMS and MOEMS 2020
KEYWORDS: Semiconductors, Ultraviolet radiation, Distortion, Photomasks, Nanoimprint lithography, Optical alignment, Semiconducting wafers, Wafer testing, Overlay metrology

Proceedings Article | 26 September 2019 Presentation + Paper
Proc. SPIE. 11148, Photomask Technology 2019
KEYWORDS: Lithography, Optical lithography, Capillaries, Particles, Photomasks, Semiconductor manufacturing, Nanoimprint lithography, Manufacturing equipment, Semiconducting wafers, Stochastic processes

Proceedings Article | 16 May 2019 Paper
Proc. SPIE. 10958, Novel Patterning Technologies for Semiconductors, MEMS/NEMS, and MOEMS 2019
KEYWORDS: Semiconductors, Data modeling, Capillaries, Ultraviolet radiation, Distortion, Photomasks, Nanoimprint lithography, Optical alignment, Semiconducting wafers, Overlay metrology

Proceedings Article | 3 October 2018 Paper
Proc. SPIE. 10810, Photomask Technology 2018
KEYWORDS: Polishing, Optical lithography, Particles, Control systems, Photomasks, Nanoimprint lithography, Semiconducting wafers, Surface finishing, Overlay metrology, Mask cleaning

Proceedings Article | 19 March 2018 Paper
Proc. SPIE. 10584, Novel Patterning Technologies 2018
KEYWORDS: Lithography, Optical lithography, Capillaries, Ultraviolet radiation, Particles, Photomasks, Nanoimprint lithography, Manufacturing equipment, Semiconducting wafers, Mask cleaning

Showing 5 of 24 publications
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