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Jin Huang
at Semiconductor Manufacturing International Corp
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Publications (1)
Proceedings Article | 5 October 2016 Paper
The study of CD side to side error in line/space pattern caused by post-exposure bake effect
Jin Huang, Eric Guo, Haiming Ge, Max Lu, Yijun Wu, Mingjing Tian, Shichuan Yan, Ran Wang
Proceedings Volume 9985, 99851N (2016) https://doi.org/10.1117/12.2241277
KEYWORDS: Critical dimension metrology, Error analysis, Semiconductor manufacturing, Control systems, Integrated circuits, Tolerancing, Electron beams, Photomasks, Neodymium, Lutetium
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