Dr. Jin Yu
at United Microelectronics Corp
SPIE Involvement:
Author
Publications (3)

PROCEEDINGS ARTICLE | March 15, 2006
Proc. SPIE. 6155, Data Analysis and Modeling for Process Control III
KEYWORDS: Cadmium, Data modeling, Scanners, Control systems, Photoresist materials, Scatterometry, Process control, Finite element methods, Critical dimension metrology, Semiconducting wafers

PROCEEDINGS ARTICLE | May 24, 2004
Proc. SPIE. 5375, Metrology, Inspection, and Process Control for Microlithography XVIII
KEYWORDS: Lithography, Metrology, Optical lithography, Data modeling, Calibration, Error analysis, Photoresist materials, Process control, Finite element methods, Critical dimension metrology

PROCEEDINGS ARTICLE | May 12, 2004
Proc. SPIE. 5754, Optical Microlithography XVIII
KEYWORDS: Optical lithography, Data modeling, Scanners, Spectroscopy, Diffusion, Physics, Scatterometry, Optical proximity correction, Photoresist processing, Single crystal X-ray diffraction

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