Dr. Jing Jiang
research engineer at IMEC
SPIE Involvement:
Author
Publications (10)

PROCEEDINGS ARTICLE | March 19, 2018
Proc. SPIE. 10583, Extreme Ultraviolet (EUV) Lithography IX
KEYWORDS: Polymers, Metals, Photons, Electrons, Photoresist materials, Extreme ultraviolet, Extreme ultraviolet lithography, Yield improvement, Photoresist developing, Absorption

PROCEEDINGS ARTICLE | October 16, 2017
Proc. SPIE. 10450, International Conference on Extreme Ultraviolet Lithography 2017
KEYWORDS: Lithography, Deep ultraviolet, Polymers, Photons, Electrons, Photoresist materials, Extreme ultraviolet, Chemical analysis, Extreme ultraviolet lithography, Chemical reactions

PROCEEDINGS ARTICLE | March 27, 2017
Proc. SPIE. 10146, Advances in Patterning Materials and Processes XXXIV
KEYWORDS: Polymers, Metals, Diffusion, Scanning electron microscopy, Photoresist materials, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Critical dimension metrology, Photoresist processing, Quenching (fluorescence), Absorption, Chemically amplified resists

PROCEEDINGS ARTICLE | March 24, 2017
Proc. SPIE. 10143, Extreme Ultraviolet (EUV) Lithography VIII
KEYWORDS: Lithography, Data modeling, Diffusion, Photomasks, Extreme ultraviolet, Chemical analysis, Extreme ultraviolet lithography, Critical dimension metrology, Neodymium, Stochastic processes, Statistical modeling, Quenching (fluorescence)

SPIE Journal Paper | July 7, 2015
JM3 Vol. 14 Issue 03
KEYWORDS: Annealing, Polymers, Scanning electron microscopy, Gas lasers, Polymer thin films, Temperature metrology, Plasma etching, Diffusion, Semiconductor lasers, Directed self assembly

PROCEEDINGS ARTICLE | May 27, 2015
Proc. SPIE. 9422, Extreme Ultraviolet (EUV) Lithography VI
KEYWORDS: Oxides, Optical lithography, Nanoparticles, Metals, Photoresist materials, Extreme ultraviolet, Extreme ultraviolet lithography, Line edge roughness, Zirconium dioxide, Photoresist developing

Showing 5 of 10 publications
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