Dr. Jing Jiang
research engineer at IMEC
SPIE Involvement:
Author
Publications (10)

PROCEEDINGS ARTICLE | March 19, 2018
Proc. SPIE. 10583, Extreme Ultraviolet (EUV) Lithography IX
KEYWORDS: Absorption, Photoresist materials, Electrons, Photons, Photoresist developing, Extreme ultraviolet lithography, Metals, Extreme ultraviolet, Polymers, Yield improvement

PROCEEDINGS ARTICLE | October 16, 2017
Proc. SPIE. 10450, International Conference on Extreme Ultraviolet Lithography 2017
KEYWORDS: Electrons, Polymers, Extreme ultraviolet lithography, Photoresist materials, Chemical analysis, Photons, Chemical reactions, Extreme ultraviolet, Deep ultraviolet, Lithography

PROCEEDINGS ARTICLE | March 27, 2017
Proc. SPIE. 10146, Advances in Patterning Materials and Processes XXXIV
KEYWORDS: Line width roughness, Metals, Extreme ultraviolet, Extreme ultraviolet lithography, Photoresist materials, Chemically amplified resists, Polymers, Quenching (fluorescence), Diffusion, Absorption, Critical dimension metrology, Photoresist processing, Scanning electron microscopy

PROCEEDINGS ARTICLE | March 24, 2017
Proc. SPIE. 10143, Extreme Ultraviolet (EUV) Lithography VIII
KEYWORDS: Extreme ultraviolet, Lithography, Extreme ultraviolet lithography, Diffusion, Quenching (fluorescence), Statistical modeling, Stochastic processes, Critical dimension metrology, Neodymium, Data modeling, Photomasks, Chemical analysis

SPIE Journal Paper | July 7, 2015
JM3 Vol. 14 Issue 03
KEYWORDS: Annealing, Polymers, Scanning electron microscopy, Gas lasers, Polymer thin films, Temperature metrology, Plasma etching, Diffusion, Semiconductor lasers, Directed self assembly

PROCEEDINGS ARTICLE | May 27, 2015
Proc. SPIE. 9422, Extreme Ultraviolet (EUV) Lithography VI
KEYWORDS: Nanoparticles, Photoresist developing, Extreme ultraviolet lithography, Photoresist materials, Oxides, Optical lithography, Extreme ultraviolet, Metals, Line edge roughness, Zirconium dioxide

Showing 5 of 10 publications
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