Dr. Jing Qin
at National Institute of Standards and Technology
SPIE Involvement:
Author
Publications (5)

PROCEEDINGS ARTICLE | September 23, 2013
Proc. SPIE. 8819, Instrumentation, Metrology, and Standards for Nanomanufacturing, Optics, and Semiconductors VII
KEYWORDS: Microscopes, Polarization, Spatial frequencies, Scattering, Sensors, Microscopy, Reflectivity, Photodiodes, Objectives, Charge-coupled devices

PROCEEDINGS ARTICLE | October 11, 2012
Proc. SPIE. 8466, Instrumentation, Metrology, and Standards for Nanomanufacturing, Optics, and Semiconductors VI
KEYWORDS: Optical imaging, Microscopes, 3D acquisition, Polarization, Scattering, Microscopy, Light scattering, Optical metrology, Critical dimension metrology, Illumination engineering

PROCEEDINGS ARTICLE | April 5, 2012
Proc. SPIE. 8324, Metrology, Inspection, and Process Control for Microlithography XXVI
KEYWORDS: Metrology, Statistical analysis, Polarization, Silicon, Light scattering, Atomic force microscopy, Data acquisition, Optical metrology, 3D metrology, 3D image processing

PROCEEDINGS ARTICLE | May 23, 2011
Proc. SPIE. 8083, Modeling Aspects in Optical Metrology III
KEYWORDS: Oxides, Metrology, Statistical analysis, Data modeling, Reflectivity, 3D modeling, Atomic force microscopy, Optical testing, Scanning electron microscopy, Model-based design

PROCEEDINGS ARTICLE | April 20, 2011
Proc. SPIE. 7971, Metrology, Inspection, and Process Control for Microlithography XXV
KEYWORDS: Oxides, Metrology, Statistical analysis, Data modeling, Reflectivity, 3D modeling, Atomic force microscopy, Optical testing, Scatter measurement, Model-based design

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