Dr. Jing Sha
at IBM Thomas J Watson Research Ctr
SPIE Involvement:
Publications (10)

Proceedings Article | 13 June 2022 Presentation
Yuping Cui, Jing Xue, Jing Sha, Zheng Guo Chen, Larry Zhuang, Derren Dunn, Jeffrery Shearer, Li-Jin Chen, Rich Wu, Charlie King
Proceedings Volume 12052, 120520R (2022) https://doi.org/10.1117/12.2614060
KEYWORDS: Optical proximity correction, Machine learning, Data modeling, Neural networks, Process modeling, Photomasks, Wafer-level optics, Semiconducting wafers, Lithography, Photoresist processing

Proceedings Article | 20 March 2019 Paper
Dongbing Shao, Jing Sha, Jinning Liu, Robert Wong
Proceedings Volume 10962, 109620Y (2019) https://doi.org/10.1117/12.2515636
KEYWORDS: Semiconducting wafers, Monte Carlo methods, Design for manufacturing, Optical lithography, Semiconductor manufacturing

Proceedings Article | 6 September 2018 Paper
Balint Meliorisz, Kafai Lai, Ulrich Welling, Hans-Jürgen Stock, Sajan Marokkey, Thomas Muelders, Jing Sha, Chi-chun Liu, Cheng Chi, Jing Guo, Clifford Osborn, Jaime Morillo, Wolfgang Demmerle, Derren Dunn
Proceedings Volume 10586, 105860R (2018) https://doi.org/10.1117/12.2297344
KEYWORDS: Metals, Directed self assembly, Critical dimension metrology, Calibration, Error analysis, Etching, Computer simulations, Process modeling, Optical lithography, Extreme ultraviolet lithography

Proceedings Article | 28 March 2018 Paper
Proceedings Volume 10584, 105840L (2018) https://doi.org/10.1117/12.2297365
KEYWORDS: Etching, Critical dimension metrology, Metals, Directed self assembly, Oxides, Back end of line, Dielectrics, Scanning electron microscopy, Tin, Lithography

Proceedings Article | 30 March 2010 Paper
Proceedings Volume 7639, 763912 (2010) https://doi.org/10.1117/12.848336
KEYWORDS: Photoresist materials, Glasses, Photoresist developing, Polymers, Silicon, Fluorine, Electron beam lithography, Microelectronics, Plasma etching, Optical lithography

Showing 5 of 10 publications
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