Dr. Jing Sha Profile

Dr. Jing Sha

at IBM Thomas J Watson Research Ctr

SPIE Involvement:

Author

Publications (10)

Proceedings Article | 13 June 2022 Presentation

Feasibility study of machine learning modeling for full chip optical proximity correction

Yuping Cui, Jing Xue, Jing Sha, Zheng Guo Chen, Larry Zhuang, Derren Dunn, Jeffrery Shearer, Li-Jin Chen, Rich Wu, Charlie King

Proceedings Volume 12052, 120520R (2022) https://doi.org/10.1117/12.2614060

KEYWORDS: Optical proximity correction, Machine learning, Data modeling, Neural networks, Process modeling, Photomasks, Wafer-level optics, Semiconducting wafers, Lithography, Photoresist processing

Read Abstract +

Proceedings Article | 20 March 2019 Paper

Incorporating process variation contours in design rule calculation and SRAM design optimization

Dongbing Shao, Jing Sha, Jinning Liu, Robert Wong

Proceedings Volume 10962, 109620Y (2019) https://doi.org/10.1117/12.2515636

KEYWORDS: Semiconducting wafers, Monte Carlo methods, Design for manufacturing, Optical lithography, Semiconductor manufacturing

Read Abstract +

Proceedings Article | 6 September 2018 Paper

Computational enablement for designs with sub-20nm metal tip to tip using cut shapes from grapho-epitaxy directed self-assembly

Balint Meliorisz, Kafai Lai, Ulrich Welling, Hans-Jürgen Stock, Sajan Marokkey, Thomas Muelders, Jing Sha, Chi-chun Liu, Cheng Chi, Jing Guo, Clifford Osborn, Jaime Morillo, Wolfgang Demmerle, Derren Dunn

Proceedings Volume 10586, 105860R (2018) https://doi.org/10.1117/12.2297344

KEYWORDS: Metals, Directed self assembly, Critical dimension metrology, Calibration, Error analysis, Etching, Computer simulations, Process modeling, Optical lithography, Extreme ultraviolet lithography

Read Abstract +

Proceedings Article | 28 March 2018 Paper

The integration of 193i and DSA for BEOL metal cuts/blocks targeting sub-20nm tip-to-tip CD

Chi-Chun Liu, Yann Mignot, Cheng Chi, Richard Farrell, Kafai Lai, Jing Guo, Jing Sha, Martin Glodde, Makoto Muramatsu, Yasuyuki Ido, Nelson Felix, David Hetzer, Andrew Metz, Daniel Corliss

Proceedings Volume 10584, 105840L (2018) https://doi.org/10.1117/12.2297365

KEYWORDS: Etching, Critical dimension metrology, Metals, Directed self assembly, Oxides, Back end of line, Dielectrics, Scanning electron microscopy, Tin, Lithography

Read Abstract +

Proceedings Article | 30 March 2010 Paper

Environmentally friendly processing of photoresists in scCO[sub]2[/sub] and decamethyltetrasiloxane

Christine Ouyang, Jin-Kyun Lee, Jing Sha, Christopher Ober

Proceedings Volume 7639, 763912 (2010) https://doi.org/10.1117/12.848336

KEYWORDS: Photoresist materials, Glasses, Photoresist developing, Polymers, Silicon, Fluorine, Electron beam lithography, Microelectronics, Plasma etching, Optical lithography

Read Abstract +

Proceedings Article | 26 March 2010 Paper

Sub-millisecond post exposure bake of chemically amplified resists by CO2 laser heat treatment

Byungki Jung, Jing Sha, Florencia Paredes, Christopher Ober, Michael Thompson, Manish Chandhok, Todd Younkin

Proceedings Volume 7639, 76390L (2010) https://doi.org/10.1117/12.848418

KEYWORDS: Diffusion, Deep ultraviolet, Carbon dioxide lasers, Polymers, Annealing, Imaging systems, Extreme ultraviolet lithography, Chemically amplified resists, Temperature metrology, Absorption

Read Abstract +

Proceedings Article | 1 April 2009 Paper

Molecular glass resists for next-generation lithography

Marie Krysak, Anuja De Silva, Jing Sha, Jin-Kyun Lee, Christopher Ober

Proceedings Volume 7273, 72732N (2009) https://doi.org/10.1117/12.814147

KEYWORDS: Etching, Glasses, Molecules, Resistance, Lithography, Magnesium, 193nm lithography, Polymers, Boron, Photoresist materials

Read Abstract +

Proceedings Article | 1 April 2009 Paper

Molecular glass resists developable in supercritical carbon dioxide for 193 nm lithography

Jing Sha, Jin-Kyun Lee, Christopher Ober

Proceedings Volume 7273, 72732T (2009) https://doi.org/10.1117/12.813956

KEYWORDS: Glasses, Molecules, Lithography, Photoresist materials, Polymers, Molecular interactions, Carbon dioxide, Refractive index, Electron beam lithography, Solids

Read Abstract +

Proceedings Article | 15 April 2008 Paper

Molecular glass resists for next generation lithography

Anuja De Silva, Nelson Felix, Jing Sha, Jin-Kyun Lee, Christopher Ober

Proceedings Volume 6923, 69231L (2008) https://doi.org/10.1117/12.772644

KEYWORDS: Magnesium, Line edge roughness, Polymers, Glasses, Lithography, Extreme ultraviolet lithography, Etching, Extreme ultraviolet, Photoresist materials, Resistance

Read Abstract +

Proceedings Article | 4 April 2008 Paper

Achieving small dimensions with an environmentally friendly solvent: photoresist development using supercritical CO2

Nelson Felix, Anuja De Silva, Jing Sha, Christopher Ober

Proceedings Volume 6923, 69233L (2008) https://doi.org/10.1117/12.772635

KEYWORDS: Glasses, Polymers, Photoresist materials, Molecules, Carbon dioxide, Photoresist developing, Magnesium, Optical lithography, Silicon, Electron beam lithography

Read Abstract +

Showing 5 of 10 publications

View contact details

UPDATE YOUR PROFILE

Is this your profile? Update it now.

Sign into your SPIE.org account

Don’t have a profile and want one?

Create an account on SPIE.org

Keywords/Phrases

Search In:

Publication Years