Dr. Jing S. Shu
Member of Technical Staff at Texas Instruments Inc
SPIE Involvement:
Author
Publications (4)

Proceedings Article | 20 March 2018 Paper
Proc. SPIE. 10587, Optical Microlithography XXXI
KEYWORDS: Lithography, Optical lithography, Scanners, Silicon, Photomasks, Source mask optimization, Optical proximity correction, Semiconducting wafers

Proceedings Article | 17 May 1994 Paper
Proc. SPIE. 2197, Optical/Laser Microlithography VII
KEYWORDS: Reticles, Etching, Quartz, Scanning electron microscopy, Photoresist materials, Photomicroscopy, Photoresist processing, Semiconducting wafers, Binary data, Phase shifts

Proceedings Article | 17 May 1994 Paper
Proc. SPIE. 2197, Optical/Laser Microlithography VII
KEYWORDS: Lithography, Reticles, Manufacturing, Reflectivity, Scanning electron microscopy, Printing, Photoresist materials, Photoresist processing, Semiconducting wafers, Phase shifts

SPIE Journal Paper | 1 October 1993
OE Vol. 32 Issue 10
KEYWORDS: Phase shifts, Reticles, Photomasks, Quartz, Lithography, Manufacturing, Chemical vapor deposition, Scanning electron microscopy, Photoresist processing, Semiconducting wafers

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