Dr. Jing S. Shu Profile

Dr. Jing S. Shu

Member of Technical Staff at Texas Instruments Inc

SPIE Involvement:

Author

Publications (4)

Proceedings Article | 20 March 2018 Paper

Improving 130nm node patterning using inverse lithography techniques for an analog process

Can Duan, Scott Jessen, David Ziger, Mizuki Watanabe, Steve Prins, Chi-Chien Ho, Jing Shu

Proc. SPIE. 10587, Optical Microlithography XXXI

KEYWORDS: Lithography, Optical lithography, Scanners, Silicon, Photomasks, Source mask optimization, Optical proximity correction, Semiconducting wafers

Read Abstract +

Proceedings Article | 17 May 1994 Paper

I-line photoresist evaluations for contact hole performance with attenuated phase-shift reticles

William Krisa, Cesar Garza, Anthony Yen, Jing Shu

Proc. SPIE. 2197, Optical/Laser Microlithography VII

KEYWORDS: Reticles, Etching, Quartz, Scanning electron microscopy, Photoresist materials, Photomicroscopy, Photoresist processing, Semiconducting wafers, Binary data, Phase shifts

Read Abstract +

Proceedings Article | 17 May 1994 Paper

Process optimization for 0.35-um i-line lithography

Cesar Garza, William Krisa, Anthony Yen, Jing Shu

Proc. SPIE. 2197, Optical/Laser Microlithography VII

KEYWORDS: Lithography, Reticles, Manufacturing, Reflectivity, Scanning electron microscopy, Printing, Photoresist materials, Photoresist processing, Semiconducting wafers, Phase shifts

Read Abstract +

SPIE Journal Paper | 1 October 1993

Benchmark comparison of i-line, alternating phase shift masks

Cesar Garza, Shane Palmer, Jing Shu

OE Vol. 32 Issue 10

KEYWORDS: Phase shifts, Reticles, Photomasks, Quartz, Lithography, Manufacturing, Chemical vapor deposition, Scanning electron microscopy, Photoresist processing, Semiconducting wafers

Read Abstract +

View contact details

UPDATE YOUR PROFILE

Is this your profile? Update it now.

Sign into your SPIE.org account

Don’t have a profile and want one?

Create an account on SPIE.org

Keywords/Phrases

Search In:

Publication Years