Dr. Jing Xue
SPIE Involvement:
Author
Publications (9)

Proceedings Article | 17 April 2020
Proc. SPIE. 11327, Optical Microlithography XXXIII
KEYWORDS: Logic, Optical lithography, Data modeling, Deep ultraviolet, Photomasks, Optical proximity correction, SRAF, Semiconducting wafers, Optics manufacturing, Yield improvement

Proceedings Article | 13 March 2012
Proc. SPIE. 8326, Optical Microlithography XXV
KEYWORDS: Optical lithography, Cadmium, Calibration, Scanning electron microscopy, Printing, Photomasks, Optical proximity correction, SRAF, Semiconducting wafers, Binary data

Proceedings Article | 29 September 2010
Proc. SPIE. 7823, Photomask Technology 2010
KEYWORDS: Calibration, Control systems, Scanning electron microscopy, Process control, Photomasks, Optical simulations, Integrated optics, Optical proximity correction, Critical dimension metrology, Semiconducting wafers

Proceedings Article | 4 March 2010
Proc. SPIE. 7640, Optical Microlithography XXIII
KEYWORDS: Lithography, Optical lithography, Data modeling, Calibration, Etching, Inspection, Optical proximity correction, Semiconducting wafers, Performance modeling, Process modeling

Proceedings Article | 24 March 2008
Proc. SPIE. 6922, Metrology, Inspection, and Process Control for Microlithography XXII
KEYWORDS: Interferometers, Sensors, Calibration, Fourier transforms, Scatterometry, Critical dimension metrology, Spherical lenses, Semiconducting wafers, Scatter measurement, Phase shifts

Showing 5 of 9 publications
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