PROCEEDINGS ARTICLE | February 18, 2011
Proc. SPIE. 7995, Seventh International Conference on Thin Film Physics and Applications
KEYWORDS: Diffraction, Mirrors, Multilayers, X-ray optics, Polishing, X-rays, Reflectivity, Extreme ultraviolet, Zone plates, Hard x-rays
For extreme ultraviolet (EUV) radiation and soft X-rays, real part of the refractive indices of all materials are very close
to unity, coupled with high absorption, makes the realization of high-reflective mirrors (just like visible and infrared
light) impossible. Multilayer is a nano-structure, alternating of low- and high-Z materials in a periodic way, which can
greatly enhance the reflectivity via the interference of light reflected from interfaces, like crystal optics. Reflective
mirrors, polarization elements, monochromators, etc, can be made basing on multi-layer structures. Zone plate is a
powerful tool to focus the light beam for EUV and soft X-ray into nanometer scale, which is produced by electron beam
etching method. However, for hard X-ray, the zone plate will has smaller width of outmost layer and larger aspect ratio,
which is difficult to realize. Multilayer Laue lens (MLL) is a promising method to overcome these limitations. MLL is a
novel linear zone plate which is produced by depositing the depth-graded multilayer, according to the zone plate law
reversely, on flat substrate and then slicing and polishing it to an ideal aspect ratio. In this paper, some recent
development of multilayer optics for EUV and X-ray regions in IPOE will be introduced.
