Prof. Jinhong Park
Senior Engineer at SAMSUNG Electronics Co Ltd
SPIE Involvement:
Author
Publications (26)

PROCEEDINGS ARTICLE | March 24, 2017
Proc. SPIE. 10143, Extreme Ultraviolet (EUV) Lithography VIII
KEYWORDS: Reticles, Logic, Scanners, Manufacturing, Pellicles, Transmittance, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Chemical elements

PROCEEDINGS ARTICLE | March 24, 2009
Proc. SPIE. 7272, Metrology, Inspection, and Process Control for Microlithography XXIII
KEYWORDS: Polarization, Calibration, Denoising, Silicon, Inspection, Reflectivity, Process control, Associative arrays, Critical dimension metrology, Semiconducting wafers

PROCEEDINGS ARTICLE | March 23, 2009
Proc. SPIE. 7272, Metrology, Inspection, and Process Control for Microlithography XXIII
KEYWORDS: Diffraction, Scanners, Error analysis, Inspection, Printing, Photomasks, Charge-coupled devices, Critical dimension metrology, Semiconducting wafers, Fiber optic illuminators

PROCEEDINGS ARTICLE | March 18, 2009
Proc. SPIE. 7271, Alternative Lithographic Technologies
KEYWORDS: Cadmium, Scanners, Reflectivity, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Optical proximity correction, Critical dimension metrology, Optical calibration, EUV optics

PROCEEDINGS ARTICLE | March 18, 2009
Proc. SPIE. 7271, Alternative Lithographic Technologies
KEYWORDS: Lithography, Light sources, Etching, Scanners, Resistance, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Optical proximity correction, Semiconducting wafers

PROCEEDINGS ARTICLE | December 4, 2008
Proc. SPIE. 7140, Lithography Asia 2008
KEYWORDS: Lithography, Point spread functions, Cadmium, Fractal analysis, Photomasks, Extreme ultraviolet, Optical proximity correction, Convolution, Modulation transfer functions, Critical dimension metrology

Showing 5 of 26 publications
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