Prof. Jinhong Park
Senior Engineer at SAMSUNG Electronics Co Ltd
SPIE Involvement:
Author
Publications (26)

Proceedings Article | 24 March 2017
Proc. SPIE. 10143, Extreme Ultraviolet (EUV) Lithography VIII
KEYWORDS: Extreme ultraviolet lithography, Manufacturing, Extreme ultraviolet, Pellicles, Photomasks, Transmittance, Logic, Scanners, Reticles, Chemical elements

Proceedings Article | 24 March 2009
Proc. SPIE. 7272, Metrology, Inspection, and Process Control for Microlithography XXIII
KEYWORDS: Critical dimension metrology, Polarization, Semiconducting wafers, Inspection, Reflectivity, Silicon, Calibration, Process control, Denoising, Associative arrays

Proceedings Article | 23 March 2009
Proc. SPIE. 7272, Metrology, Inspection, and Process Control for Microlithography XXIII
KEYWORDS: Photomasks, Semiconducting wafers, Inspection, Critical dimension metrology, Error analysis, Diffraction, Scanners, Printing, Fiber optic illuminators, Charge-coupled devices

Proceedings Article | 18 March 2009
Proc. SPIE. 7271, Alternative Lithographic Technologies
KEYWORDS: Extreme ultraviolet lithography, Photomasks, Extreme ultraviolet, Optical proximity correction, Reflectivity, Scanners, Critical dimension metrology, EUV optics, Optical calibration, Cadmium

Proceedings Article | 18 March 2009
Proc. SPIE. 7271, Alternative Lithographic Technologies
KEYWORDS: Extreme ultraviolet lithography, Extreme ultraviolet, Lithography, Etching, Photomasks, Semiconducting wafers, Scanners, Optical proximity correction, Light sources, Resistance

Proceedings Article | 4 December 2008
Proc. SPIE. 7140, Lithography Asia 2008
KEYWORDS: Point spread functions, Fractal analysis, Extreme ultraviolet, Lithography, Optical proximity correction, Photomasks, Critical dimension metrology, Modulation transfer functions, Convolution, Cadmium

Showing 5 of 26 publications
SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top