Jinhua Ning
at Shanghai Institute of Technical Physics CAS
SPIE Involvement:
Author
Publications (1)

PROCEEDINGS ARTICLE | November 18, 2008
Proc. SPIE. 7135, Optoelectronic Materials and Devices III
KEYWORDS: Indium gallium arsenide, Etching, Argon, Ions, Scanning electron microscopy, Plasma etching, Reactive ion etching, Chlorine, Anisotropic etching, Plasma

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