Jinhyuck Jun
at SK Hynix Inc
SPIE Involvement:
Publications (10)

Proceedings Article | 4 April 2017 Presentation + Paper
Jinhyuck Jun, Jaehee Hwang, Jaeseung Choi, Seyoung Oh, Chanha Park, Hyunjo Yang, Thuc Dam, Munhoe Do, Dong Chan Lee, Guangming Xiao, Jung-Hoe Choi, Kevin Lucas
Proceedings Volume 10148, 1014809 (2017) https://doi.org/10.1117/12.2257857
KEYWORDS: Lithography, Optical proximity correction, Optical lithography, Manufacturing, Photomasks, Semiconducting wafers, Atrial fibrillation, Source mask optimization, Image processing

Proceedings Article | 24 March 2016 Paper
Proceedings Volume 9778, 97781S (2016) https://doi.org/10.1117/12.2219467
KEYWORDS: Overlay metrology, Optical proximity correction, Diffraction, Critical dimension metrology, Metrology, Scanning electron microscopy, Electron microscopes, Optical lithography, Error analysis, Target detection

Proceedings Article | 18 March 2015 Paper
Jinhyuck Jun, Minwoo Park, Chanha Park, Hyunjo Yang, Donggyu Yim, Munhoe Do, Dongchan Lee, Taehoon Kim, Junghoe Choi, Gerard Luk-Pat, Alex Miloslavsky
Proceedings Volume 9427, 94270D (2015) https://doi.org/10.1117/12.2085460
KEYWORDS: Atrial fibrillation, Semiconducting wafers, Photomasks, Critical dimension metrology, Optical proximity correction, Nanoimprint lithography, Lithography, Printing, SRAF, Manufacturing

Proceedings Article | 28 March 2014 Paper
Proceedings Volume 9053, 90530J (2014) https://doi.org/10.1117/12.2046541
KEYWORDS: Photomasks, Optical proximity correction, SRAF, Printing, Semiconducting wafers, 3D modeling, Calibration, Optimization (mathematics), Source mask optimization, Manufacturing

Proceedings Article | 1 October 2013 Paper
Proceedings Volume 8880, 88801U (2013) https://doi.org/10.1117/12.2026140
KEYWORDS: Optical proximity correction, Image quality, Optimization (mathematics), Nanoimprint lithography, Image enhancement, Image processing, Design for manufacturing, Resolution enhancement technologies, Neodymium, Nano opto mechanical systems

Showing 5 of 10 publications
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