Dr. Jinseok Heo
at SAMSUNG Electronics Co Ltd
SPIE Involvement:
Author
Publications (5)

PROCEEDINGS ARTICLE | April 10, 2013
Proc. SPIE. 8681, Metrology, Inspection, and Process Control for Microlithography XXVII
KEYWORDS: Semiconductors, Lithography, Electronics, Scanners, Fourier transforms, Control systems, Process control, Semiconducting wafers, Overlay metrology, Instrument modeling

SPIE Journal Paper | October 1, 2011
JM3 Vol. 10 Issue 04
KEYWORDS: Scanners, Semiconducting wafers, Inspection, Calibration, Lithography, Image analysis, Spatial resolution, Scanning electron microscopy, Imaging systems, Overlay metrology

PROCEEDINGS ARTICLE | April 20, 2011
Proc. SPIE. 7971, Metrology, Inspection, and Process Control for Microlithography XXV
KEYWORDS: Radon, Calibration, Scanners, Inspection, Image resolution, Scanning electron microscopy, Image enhancement, Optical fiber cables, Spatial resolution, Semiconducting wafers

PROCEEDINGS ARTICLE | March 24, 2009
Proc. SPIE. 7272, Metrology, Inspection, and Process Control for Microlithography XXIII
KEYWORDS: Polarization, Calibration, Denoising, Silicon, Inspection, Reflectivity, Process control, Associative arrays, Critical dimension metrology, Semiconducting wafers

PROCEEDINGS ARTICLE | March 23, 2009
Proc. SPIE. 7272, Metrology, Inspection, and Process Control for Microlithography XXIII
KEYWORDS: Diffraction, Scanners, Error analysis, Inspection, Printing, Photomasks, Charge-coupled devices, Critical dimension metrology, Semiconducting wafers, Fiber optic illuminators

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