Mr. Jinyoung Yoon
at SAMSUNG Electronics Co Ltd
SPIE Involvement:
Author
Publications (6)

PROCEEDINGS ARTICLE | April 1, 2009
Proc. SPIE. 7273, Advances in Resist Materials and Processing Technology XXVI
KEYWORDS: Lithography, Electronics, Optical lithography, Image compression, Polymers, Diffusion, Electroluminescence, Photoresist materials, Resolution enhancement technologies, Temperature metrology

PROCEEDINGS ARTICLE | December 4, 2008
Proc. SPIE. 7140, Lithography Asia 2008
KEYWORDS: Lithography, Optical lithography, Reflectivity, Control systems, Electroluminescence, Scanning electron microscopy, Photomasks, Line width roughness, Immersion lithography, Critical dimension metrology

PROCEEDINGS ARTICLE | March 29, 2006
Proc. SPIE. 6153, Advances in Resist Technology and Processing XXIII
KEYWORDS: Lithography, Polymers, Coating, Scanning electron microscopy, Photoresist materials, Extreme ultraviolet, Extreme ultraviolet lithography, Thin film coatings, Semiconducting wafers, Photoresist developing

PROCEEDINGS ARTICLE | March 24, 2006
Proc. SPIE. 6152, Metrology, Inspection, and Process Control for Microlithography XX
KEYWORDS: Semiconductors, Spectrum analysis, Statistical analysis, Polarization, Photoresist materials, Software development, Line width roughness, Transistors, Critical dimension metrology, Edge roughness

PROCEEDINGS ARTICLE | May 14, 2004
Proc. SPIE. 5376, Advances in Resist Technology and Processing XXI
KEYWORDS: Lithography, Optical lithography, Calibration, Interfaces, Electron microscopes, 3D modeling, Scanning electron microscopy, Thermal modeling, Resolution enhancement technologies, Temperature metrology

PROCEEDINGS ARTICLE | May 14, 2004
Proc. SPIE. 5376, Advances in Resist Technology and Processing XXI
KEYWORDS: Lithography, Optical lithography, Cadmium, Image processing, Photoresist materials, Photomasks, Critical dimension metrology, Semiconducting wafers, Resolution enhancement technologies, Temperature metrology

Showing 5 of 6 publications
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