Jirka Schatz
at GLOBALFOUNDRIES Dresden Module One LLC & Co KG
SPIE Involvement:
Author
Publications (7)

SPIE Journal Paper | 15 April 2019
JM3 Vol. 18 Issue 02
KEYWORDS: Scanning electron microscopy, Overlay metrology, Semiconducting wafers, Error analysis, Etching, Metrology, Distance measurement, Control systems, Lithography, Scanners

Proceedings Article | 19 September 2018
Proc. SPIE. 10775, 34th European Mask and Lithography Conference
KEYWORDS: Metrology, Statistical analysis, Etching, Image processing, Error analysis, Scanning electron microscopy, Distance measurement, Optical alignment, Semiconducting wafers, Overlay metrology

SPIE Journal Paper | 6 March 2018
JM3 Vol. 17 Issue 01
KEYWORDS: Etching, Scanning electron microscopy, Data modeling, Optical proximity correction, Optical lithography, Performance modeling, Calibration, Anisotropic etching, Artificial neural networks, 3D modeling

Proceedings Article | 28 September 2017
Proc. SPIE. 10446, 33rd European Mask and Lithography Conference
KEYWORDS: Optical lithography, Calibration, Etching, Physics, Scanning electron microscopy, Photoresist materials, Distance measurement, Optical proximity correction, Anisotropic etching

Proceedings Article | 28 September 2017
Proc. SPIE. 10446, 33rd European Mask and Lithography Conference
KEYWORDS: Metrology, Data modeling, Calibration, Etching, Image processing, Scanning electron microscopy, Buildings, Optical proximity correction, Performance modeling, Resolution enhancement technologies

Showing 5 of 7 publications
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