Jirka Schatz
at GLOBALFOUNDRIES Dresden Module One LLC & Co KG
SPIE Involvement:
Author
Publications (10)

Proceedings Article | 9 March 2021 Presentation + Paper
Proc. SPIE. 11611, Metrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV

Proceedings Article | 22 February 2021 Presentation + Paper
Proc. SPIE. 11613, Optical Microlithography XXXIV
KEYWORDS: Lithography, Metrology, Optical lithography, Data modeling, Calibration, Computer simulations, Scanning electron microscopy, Data acquisition, Process modeling, Resolution enhancement technologies

Proceedings Article | 23 March 2020 Presentation + Paper
Proc. SPIE. 11327, Optical Microlithography XXXIII
KEYWORDS: Oxides, Lithography, Etching, Ions, Silicon, Photomasks, Optical proximity correction, Semiconducting wafers, Process modeling

SPIE Journal Paper | 15 April 2019
JM3 Vol. 18 Issue 02
KEYWORDS: Scanning electron microscopy, Overlay metrology, Semiconducting wafers, Error analysis, Etching, Metrology, Distance measurement, Control systems, Lithography, Scanners

Proceedings Article | 19 September 2018 Paper
Proc. SPIE. 10775, 34th European Mask and Lithography Conference
KEYWORDS: Metrology, Statistical analysis, Etching, Image processing, Error analysis, Scanning electron microscopy, Distance measurement, Optical alignment, Semiconducting wafers, Overlay metrology

Showing 5 of 10 publications
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