Jishuo Yang
at Shanghai Institute of Optics and Fine Mechanics
SPIE Involvement:
Author
Publications (7)

SPIE Journal Paper | November 13, 2014
JM3 Vol. 14 Issue 01
KEYWORDS: Photomasks, In situ metrology, Process modeling, Image processing, Lithography, Principal component analysis, Error analysis, Image retrieval, Semiconducting wafers, Zernike polynomials

PROCEEDINGS ARTICLE | March 31, 2014
Proc. SPIE. 9052, Optical Microlithography XXVII
KEYWORDS: Lithography, Monochromatic aberrations, Principal component analysis, Lenses, Image processing, In situ metrology, Zernike polynomials, Photomasks, Image retrieval, Process modeling

PROCEEDINGS ARTICLE | March 31, 2014
Proc. SPIE. 9052, Optical Microlithography XXVII
KEYWORDS: Lithography, Principal component analysis, Polarization, Databases, Image processing, In situ metrology, Error analysis, Photomasks, Image retrieval, Process modeling

SPIE Journal Paper | June 11, 2013
OE Vol. 52 Issue 06
KEYWORDS: In situ metrology, Image processing, Principal component analysis, Process modeling, Lithography, Matrices, Optical engineering, Image retrieval, Lithographic illumination, Zernike polynomials

SPIE Journal Paper | May 7, 2013
OE Vol. 52 Issue 05
KEYWORDS: Photomasks, Lithography, Artificial intelligence, Principal component analysis, Optical engineering, Process modeling, Wavefront aberrations, Monochromatic aberrations, Instrument modeling, Mechanics

PROCEEDINGS ARTICLE | December 18, 2012
Proc. SPIE. 8550, Optical Systems Design 2012
KEYWORDS: Lithography, Principal component analysis, Statistical analysis, Lithographic illumination, Imaging systems, Matrices, Image processing, Error analysis, Artificial intelligence, Process modeling

Showing 5 of 7 publications
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