Dr. Jisoong Park
at SAMSUNG Electronics Co Ltd
SPIE Involvement:
Author
Publications (19)

Proceedings Article | 23 October 2015 Paper
Proc. SPIE. 9635, Photomask Technology 2015
KEYWORDS: Cadmium, Calibration, Etching, Error analysis, Computer simulations, Scanning electron microscopy, Photomasks, Photoresist processing, Statistical modeling, Process modeling

Proceedings Article | 23 October 2015 Paper
Proc. SPIE. 9635, Photomask Technology 2015
KEYWORDS: Data modeling, Calibration, Reliability, Distortion, Scanning electron microscopy, Critical dimension metrology, Statistical modeling, Model-based design, Process modeling, Reverse modeling

Proceedings Article | 8 October 2014 Paper
Proc. SPIE. 9235, Photomask Technology 2014
KEYWORDS: Lithography, Modulation, Ions, Control systems, Data processing, Photomasks, Optical proximity correction, Model-based design, Vestigial sideband modulation, Resolution enhancement technologies

SPIE Journal Paper | 2 December 2013
JM3 Vol. 13 Issue 01
KEYWORDS: Photomasks, Electron beam lithography, Computational lithography, Lithography, Manufacturing, Data modeling, Optical proximity correction, Vestigial sideband modulation, Semiconducting wafers, Model-based design

Proceedings Article | 12 April 2013 Paper
Proc. SPIE. 8683, Optical Microlithography XXVI
KEYWORDS: Lithography, Electron beam lithography, Optical lithography, Data modeling, Manufacturing, Photomasks, Computational lithography, Optical proximity correction, Computer aided design, Semiconducting wafers

Showing 5 of 19 publications
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