Jisun Ryu
at Hynix Semiconductor Inc
SPIE Involvement:
Author
Publications (6)

Proceedings Article | 11 May 2009
Proc. SPIE. 7379, Photomask and Next-Generation Lithography Mask Technology XVI
KEYWORDS: Lithography, Contamination, Air contamination, Inspection, Pellicles, Transmittance, Photomasks, Critical dimension metrology, Fluorine, Semiconducting wafers

Proceedings Article | 17 October 2008
Proc. SPIE. 7122, Photomask Technology 2008
KEYWORDS: Lithography, Optical lithography, Coherence (optics), Opacity, Printing, Solids, Photomasks, Critical dimension metrology, Semiconducting wafers, Fiber optic illuminators

Proceedings Article | 17 October 2008
Proc. SPIE. 7122, Photomask Technology 2008
KEYWORDS: Lithography, Contamination, Quartz, Air contamination, Pellicles, Transmittance, Photomasks, Critical dimension metrology, Semiconducting wafers, 193nm lithography

Proceedings Article | 30 October 2007
Proc. SPIE. 6730, Photomask Technology 2007
KEYWORDS: Metrology, Air contamination, Ultraviolet radiation, Particles, Molecules, Ions, Reflectivity, Chromium, Photomasks, Critical dimension metrology

Proceedings Article | 20 October 2006
Proc. SPIE. 6349, Photomask Technology 2006
KEYWORDS: Opacity, Quartz, Air contamination, Ultraviolet radiation, Particles, Ions, Chemistry, Chromium, Photomasks, Photoresist processing

Showing 5 of 6 publications
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