Jiun-Hau Fu
at Nanya Technology Corp
SPIE Involvement:
Author
Publications (2)

Proceedings Article | 23 March 2020 Paper
Proc. SPIE. 11323, Extreme Ultraviolet (EUV) Lithography XI
KEYWORDS: Data modeling, Photomasks, Extreme ultraviolet, Source mask optimization, Optical proximity correction, Critical dimension metrology, Molybdenum, Semiconducting wafers, Array processing, EUV optics

Proceedings Article | 23 March 2020 Presentation + Paper
Proc. SPIE. 11328, Design-Process-Technology Co-optimization for Manufacturability XIV
KEYWORDS: Semiconductors, Lithography, Metals, Manufacturing, Photomasks, Associative arrays, Optical proximity correction

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