Jiwan Han
at Mentor Graphics (Korea) LLC.
SPIE Involvement:
Author
Publications (2)

PROCEEDINGS ARTICLE | March 20, 2018
Proc. SPIE. 10587, Optical Microlithography XXXI
KEYWORDS: Lithography, Optical lithography, Photomasks, Source mask optimization

PROCEEDINGS ARTICLE | March 24, 2016
Proc. SPIE. 9778, Metrology, Inspection, and Process Control for Microlithography XXX
KEYWORDS: Lithography, Photovoltaics, Optical lithography, Defect detection, Visualization, Ions, Distance measurement, Photomasks, Computational lithography, Optical proximity correction, Critical dimension metrology, Bromine

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