Jiwan Han
at Mentor Graphics (Korea) LLC.
SPIE Involvement:
Author
Publications (2)

Proceedings Article | 20 March 2018
Proc. SPIE. 10587, Optical Microlithography XXXI
KEYWORDS: Photomasks, Lithography, Source mask optimization, Optical lithography

Proceedings Article | 24 March 2016
Proc. SPIE. 9778, Metrology, Inspection, and Process Control for Microlithography XXX
KEYWORDS: Lithography, Photomasks, Computational lithography, Critical dimension metrology, Defect detection, Optical proximity correction, Photovoltaics, Optical lithography, Visualization, Distance measurement, Bromine, Ions

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