Dr. Jo Finders
Senior Imaging Scientist/Fellow at ASML Netherlands BV
SPIE Involvement:
Author | Editor
Publications (108)

Proceedings Article | 12 May 2020
Proc. SPIE. 11323, Extreme Ultraviolet (EUV) Lithography XI
KEYWORDS: Critical dimension metrology, Semiconducting wafers, Nanoimprint lithography, Extreme ultraviolet lithography, Finite element methods, Optical lithography, Photomasks, Extreme ultraviolet, Stochastic processes, Inspection

SPIE Journal Paper | 6 May 2020
JM3 Vol. 19 Issue 02
KEYWORDS: Diffraction, Photomasks, Phase shifts, Picosecond phenomena, 3D modeling, Extreme ultraviolet, Refractive index, Scanners, Nanoimprint lithography, Tantalum

Proceedings Article | 26 September 2019
Proc. SPIE. 11147, International Conference on Extreme Ultraviolet Lithography 2019
KEYWORDS: Photomasks, Extreme ultraviolet, Reticles, Nanoimprint lithography, Extreme ultraviolet lithography, Phase shifts, Scanners, Diffraction, Source mask optimization, EUV optics

Proceedings Article | 29 August 2019
Proc. SPIE. 11177, 35th European Mask and Lithography Conference (EMLC 2019)
KEYWORDS: Photomasks, Phase shifts, Extreme ultraviolet, Diffraction, Scanners, Extreme ultraviolet lithography, Reticles

Proceedings Article | 1 May 2019
Proc. SPIE. 10957, Extreme Ultraviolet (EUV) Lithography X
KEYWORDS: Photomasks, Absorption, Reticles, Extreme ultraviolet lithography, Tantalum, Diffraction, Etching, Refractive index, Scanners, Distortion

Showing 5 of 108 publications
Proceedings Volume Editor (4)

SPIE Conference Volume | 25 September 2018

SPIE Conference Volume | 18 October 2017

SPIE Conference Volume | 26 October 2016

SPIE Conference Volume | 18 September 2015

Conference Committee Involvement (11)
35th European Mask and Lithography Conference (EMLC 2019)
17 June 2019 | Dresden, Germany
34th European Mask and Lithography Conference
18 June 2018 | Grenoble, France
33rd European Mask and Lithography Conference
26 June 2017 | Dresden, Germany
Optical Microlithography XXX
28 February 2017 | San Jose, California, United States
32nd European Mask and Lithography Conference
21 June 2016 | Dresden, Germany
Showing 5 of 11 Conference Committees
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