Dr. Job Beckers Profile

Dr. Job Beckers

at Technische Univ. Eindhoven

SPIE Involvement:

Author

Publications (5)

Proceedings Article | 10 April 2024 Presentation + Paper

Particle mobilization by EUV-induced plasma and fast electrons

Mark van de Kerkhof, Dmitry Shefer, Andrey Nikipelov, Fabio Sbrizzai, Vladimir Kvon, Sim Bouwmans, Job Beckers, Vadim Banine

Proceedings Volume 12953, 129530E (2024) https://doi.org/10.1117/12.3009896

KEYWORDS: Particles, Plasma, Electrons, Adhesion, Scanners, Hydrogen, Extreme ultraviolet lithography, Ions, Stochastic processes, Particle contamination

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Proceedings Article | 27 April 2023 Poster + Paper

The role of neutral drag force in pulsed plasma enabled particle contamination control

Job Beckers, Judith van Huijstee, Paul Blom, Federico Medini, Ton Peijnenburg

Proceedings Volume 12496, 1249631 (2023) https://doi.org/10.1117/12.2658259

KEYWORDS: Plasma, Particles, Electric fields, Simulations, Particle contamination, Contamination control, Contamination, Switching, Electrodes, Vacuum

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Proceedings Article | 22 February 2021 Poster + Presentation + Paper

Morphology change and release of tin and lead micro-particles from substrates in hydrogen plasma

Dmitry Shefer, Andrey Nikipelov, Mark van de Kerkhof, Vadim Banine, Job Beckers

Proceedings Volume 11609, 116091F (2021) https://doi.org/10.1117/12.2581666

KEYWORDS: Plasma, Particles, Hydrogen, Tin, Lead, Extreme ultraviolet lithography, Ions, Semiconducting wafers, Reticles, Extreme ultraviolet

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Proceedings Article | 22 February 2021 Poster + Paper

Plasma assisted particle contamination control: plasma charging dependence on particle morphology

J. C. A. van Huijstee, B. van Minderhout, R. M. H. Rompelberg, P. Blom, T. Peijnenburg, J. Beckers

Proceedings Volume 11611, 116113A (2021) https://doi.org/10.1117/12.2584607

KEYWORDS: Plasma, Particles, Contamination control, Particle contamination, Semiconductors, Extreme ultraviolet lithography, Contamination, Spherical lenses, Scanners, Robotics

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Proceedings Article | 23 March 2020 Paper

Particle contamination control by application of plasma

Job Beckers, Boy van Minderhout, Paul Blom, Gerrit Kroesen, Ton Peijnenburg

Proceedings Volume 11323, 113232L (2020) https://doi.org/10.1117/12.2560192

KEYWORDS: Particles, Plasma, Contamination control, Extreme ultraviolet, Extreme ultraviolet lithography, Contamination, Scanners, Particle contamination, Electrons, Electrodes

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