Dr. Jochen Schacht
at Infineon Technologies AG
SPIE Involvement:
Author
Publications (5)

Proceedings Article | 26 March 2007
Proc. SPIE. 6520, Optical Microlithography XX
KEYWORDS: Metrology, Data modeling, Calibration, Image processing, Feature extraction, Scanning electron microscopy, Optical proximity correction, Semiconducting wafers, Process modeling, Resolution enhancement technologies

Proceedings Article | 21 March 2007
Proc. SPIE. 6521, Design for Manufacturability through Design-Process Integration
KEYWORDS: Lithography, Image processing, Resistance, Photomasks, Transistors, Integrated circuits, Semiconducting wafers, Integrated circuit design, Overlay metrology, Classification systems

Proceedings Article | 28 May 2004
Proc. SPIE. 5377, Optical Microlithography XVII
KEYWORDS: Thin films, Metrology, Data modeling, Calibration, Image processing, Error analysis, Image acquisition, Optical proximity correction, Photoresist processing, Process modeling

Proceedings Article | 28 May 2004
Proc. SPIE. 5377, Optical Microlithography XVII
KEYWORDS: Lithography, Monochromatic aberrations, Reticles, Scanning electron microscopy, Image transmission, Transmittance, Photomasks, Critical dimension metrology, Binary data, Phase shifts

Proceedings Article | 14 May 2004
Proc. SPIE. 5376, Advances in Resist Technology and Processing XXI
KEYWORDS: Lithography, Reticles, Etching, Metals, Glasses, Scanning electron microscopy, Critical dimension metrology, Line edge roughness, Photoresist processing, Semiconducting wafers

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