Dr. Jochen Schacht
at Mentor Graphics Taiwan Ltd
SPIE Involvement:
Author
Publications (5)

PROCEEDINGS ARTICLE | March 13, 2012
Proc. SPIE. 8326, Optical Microlithography XXV
KEYWORDS: Lithography, Logic, Visualization, Manufacturing, Printing, Photomasks, Optical proximity correction, SRAF, Resolution enhancement technologies, Fiber optic illuminators

PROCEEDINGS ARTICLE | March 13, 2009
Proc. SPIE. 7275, Design for Manufacturability through Design-Process Integration III
KEYWORDS: Lithography, Reticles, Atrial fibrillation, Manufacturing, Electroluminescence, Photomasks, Optical proximity correction, Semiconducting wafers, Autoregressive models, Model-based design

PROCEEDINGS ARTICLE | March 13, 2009
Proc. SPIE. 7275, Design for Manufacturability through Design-Process Integration III
KEYWORDS: Wafer-level optics, Lithography, Data modeling, Visualization, Databases, Photomasks, Optical proximity correction, SRAF, Semiconducting wafers, Electronic design automation

PROCEEDINGS ARTICLE | December 4, 2008
Proc. SPIE. 7140, Lithography Asia 2008
KEYWORDS: Lithography, Manufacturing, Printing, Optical proximity correction, SRAF, Critical dimension metrology, Optimization (mathematics), Semiconducting wafers, Model-based design, Resolution enhancement technologies

PROCEEDINGS ARTICLE | March 24, 2008
Proc. SPIE. 6922, Metrology, Inspection, and Process Control for Microlithography XXII
KEYWORDS: Lithography, Optical lithography, Data modeling, Calibration, Scanning electron microscopy, Finite element methods, Optical proximity correction, Semiconducting wafers, Model-based design, Process modeling

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