Dr. Joe Lee
at IBM Corp
SPIE Involvement:
Author
Publications (4)

Proceedings Article | 6 April 2020 Presentation + Paper
Proc. SPIE. 11323, Extreme Ultraviolet (EUV) Lithography XI
KEYWORDS: Amorphous silicon, Lithography, Optical lithography, Etching, Scanning electron microscopy, Extreme ultraviolet, Extreme ultraviolet lithography, Critical dimension metrology, Line edge roughness, Oxidation

SPIE Journal Paper | 31 July 2018
JM3 Vol. 18 Issue 01
KEYWORDS: Etching, Extreme ultraviolet, Line edge roughness, Optical lithography, Line width roughness, Silicon, Double patterning technology, Dielectrics, Metals, System on a chip

Proceedings Article | 4 April 2018 Paper
Proc. SPIE. 10589, Advanced Etch Technology for Nanopatterning VII
KEYWORDS: Optical lithography, Etching, Metals, Image processing, Dielectrics, Silicon, Extreme ultraviolet, Line width roughness, Double patterning technology, Line edge roughness

Proceedings Article | 24 March 2017 Presentation + Paper
Proc. SPIE. 10143, Extreme Ultraviolet (EUV) Lithography VIII
KEYWORDS: Lithography, Optical lithography, Etching, Metals, Interfaces, Silicon, Quantum efficiency, Materials processing, Photoresist materials, Extreme ultraviolet, Extreme ultraviolet lithography, Photoresist processing

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