Dr. Joel Seligson
at
SPIE Involvement:
Senior status | Author
Publications (10)

PROCEEDINGS ARTICLE | March 14, 2008
Proc. SPIE. 6922, Metrology, Inspection, and Process Control for Microlithography XXII
KEYWORDS: Diffraction, Metrology, Optical lithography, Detection and tracking algorithms, Imaging systems, Sensors, Image processing, Spectroscopy, Scatterometry, Overlay metrology

PROCEEDINGS ARTICLE | May 10, 2005
Proc. SPIE. 5752, Metrology, Inspection, and Process Control for Microlithography XIX
KEYWORDS: Optical design, MATLAB, Image processing, Computer simulations, Signal processing, Photoresist processing, Semiconducting wafers, Performance modeling, Overlay metrology, Device simulation

PROCEEDINGS ARTICLE | May 24, 2004
Proc. SPIE. 5375, Metrology, Inspection, and Process Control for Microlithography XVIII
KEYWORDS: Reticles, Metrology, Metals, Scanners, Copper, Diagnostics, Aluminum, Semiconducting wafers, Overlay metrology, Back end of line

PROCEEDINGS ARTICLE | June 2, 2003
Proc. SPIE. 5038, Metrology, Inspection, and Process Control for Microlithography XVII
KEYWORDS: Wafer-level optics, Diffraction, Metrology, Silicon, Optical testing, Monte Carlo methods, Semiconducting wafers, Electromagnetism, Overlay metrology, Standards development

PROCEEDINGS ARTICLE | July 16, 2002
Proc. SPIE. 4689, Metrology, Inspection, and Process Control for Microlithography XVI
KEYWORDS: Wafer-level optics, Monochromatic aberrations, Metrology, Metals, Tungsten, Silicon, Optical alignment, Semiconducting wafers, Overlay metrology, Chemical mechanical planarization

PROCEEDINGS ARTICLE | July 16, 2002
Proc. SPIE. 4689, Metrology, Inspection, and Process Control for Microlithography XVI
KEYWORDS: Wafer-level optics, Reticles, Metrology, Calibration, Etching, Scanners, Manufacturing, Optical testing, Semiconducting wafers, Overlay metrology

Showing 5 of 10 publications
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